Abstract
A new mask inspection system for EUVL is being developed. The resolution of previously developed actinic inspection systems, which employ FZP or Schwarzschild optics, is limited to 60nm. This prompted us to develop a new unorthodox mask inspection system: a lensless microscope with a coherent light source. This system can detect defects only a few nanometers wide, and it enables CD measurements with a 3σ accuracy of 0.32nm.
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