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Abstract
The technology of antireflective coatings formation on textured silicon by magnetron sputtering was developed. The growth rates of individuals thin films were determined as well as their refractive indexes. According to the results obtained an antireflective coating based on SiO2/Si3N4 on textured silicon with a thickness of SiO2 68 nm and Si3N4 of 74 nm showed the lowest reflection.
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