Abstract
Deposition potential, deposition time, square-wave frequency, rotation speed of the rotating disc electrode and gallium concentration have been studied in detail, for trace concentration level determination of gallium metal in U–Ga alloy by square-wave voltammetry anodic stripping analysis, in 1 M NaClO 4 + 0.5 M NaSCN at mercury film electrode (MFE). Optimum conditions have been found for Ga(III) determination by obtaining calibration graphs for the range 1–10 × 10 −7 M gallium. Error and standard deviation less than 1% were assessed of this method with all gallium standard solutions. The developed methodology was applied successfully as a subsidiary method for the determination of gallium content in synthetic U–Ga samples with very good precision and accuracy (under 1% error and std. dev.).
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