Development of an X-ray photoelectron microscopic system with a compact X-ray source

Abstract

We have constructed an X-ray photoelectron microscopic system. An X-ray source is a laser-produced plasma in a scheme of an X-ray laser experiment. X rays involving amplified spontaneous emissions (ASE) at 15.47 nm were delivered with a 10-Hz repetition rate from a compact X-ray laser system. X rays were collected and focused by a Schwarzschild optics coated with Mo/Si multilayers for a 15.47-nm X ray. Photoelectron signals due to the Ga 3d and As 3d electrons were observed, when a GaAs wafer was used as a sample. The spatial resolution of about 1 μm was confirmed.