Abstract
The present work consists of development of an integrated deposition system comprising Physical Vapour Deposition (PVD) and Chemical Vapour Deposition (CVD) as sub systems aimed at achieving a wide range of thin film depositions. The detailed requirements for system development were investigated, and a customized unique deposition system has been developed. The developed system can find applications to develop thin films of a range of material on various substrate materials. Certain experimentation has been conducted for graphene growth on CVD set up. Characterization has been done by optical microscope and SEM technique. An insight into experimentations suggest that process parameters like temperature, pressure of CVD chamber and mass flow rates of precursor gases act as influencing factors for the resultant uniformity and thickness of graphene growth layer.
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