Abstract

A metrological atomic force microscope with a tip-tilting mechanism (tilting-mAFM) has been developed to expand the capabilities of 3D nanometrology, particularly for high-resolution topography measurements at the surfaces of vertical sidewalls and for traceable measurements of nanodevice linewidth. In the tilting-mAFM, the probe tip is tilted from vertical to 16° at maximum such that the probe tip can touch and trace the vertical sidewall of a nanometer-scale structure; the probe of a conventional atomic force microscope cannot reach the vertical surface because of its finite cone angle. Probe displacement is monitored in three axes by using high-resolution laser interferometry, which is traceable to the SI unit of length. A central-symmetric 3D scanner with a parallel spring structure allows probe scanning with extremely low interaxial crosstalk. A unique technique for scanning vertical sidewalls was also developed and applied. The experimental results indicated high repeatability in the scanned profiles and sidewall angle measurements. Moreover, the 3D measurement of a line pattern was demonstrated, and the data from both sidewalls were successfully stitched together with subnanometer accuracy. Finally, the critical dimension of the line pattern was obtained.

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