Abstract
A laser-induced forward transfer (LIFT) technique is developed for the patterning of carbon nanotube (CNT) emitters under ambient pressure and temperature conditions. In the proposed approach, a 1064 nm Nd:YAG pulsed laser beam is passed through a transparent support substrate coated with a thin CNT film with a thickness of 2.5 µm. The laser fluence of 1.96 J/cm2 causes the CNTs to be transferred onto an acceptor substrate without causing any damage to the support substrate. Preliminary field emission tests of CNT patterns deposited on a silver paste layer confirm the effectiveness of the proposed patterning approach.A laser-induced forward transfer (LIFT) technique is developed for the patterning of carbon nanotube (CNT) emitters under ambient pressure and temperature conditions. In the proposed approach, a 1064 nm Nd:YAG pulsed laser beam is passed through a transparent support substrate coated with a thin CNT film with a thickness of 2.5 µm. The laser fluence of 1.96 J/cm2 causes the CNTs to be transferred onto an acceptor substrate without causing any damage to the support substrate. Preliminary field emission tests of CNT patterns deposited on a silver paste layer confirm the effectiveness of the proposed patterning approach.
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