Abstract
The principles and properties of ultraviolet (UV) and vacuum ultraviolet (VUV) radiation generated by decaying excimer complexes are discussed. Excimer lamps offer very high intensity (before saturation effects start to limit the spontaneous emission) narrow-band radiation, at various UV and VUV wavelengths, are highly efficient (with no self absorption), and can provide high photon fluxes over large areas. For large-scale industrial applications silent (dielectric-barrier) discharges using simple geometric configurations are therefore possible. Applications of these sources include photo-deposition of large area or patterned thin metal films, of high-and low-dielectric-constant insulating layers, low-temperature oxidation of Si, SiGe and Ge, and annealing, curing, cleaning, etching and microstructuring of surfaces, demonstrating that these low cost systems can provide an interesting alternative to excimer lasers for industrial large-scale low-temperature materials processing.
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