Abstract

AlCrTaTiZr, AlCrTaTiZr nitride, and AlCrTaTiZr oxide coatings as tritium permeation barriers (TPBs) were prepared by magnetron co-sputtering technology on a CLF-1 (RAFM) substrate, to evaluate their hydrogen/deuterium permeation resistance. X-ray diffraction (XRD) analysis showed that the as-deposited coatings were amorphous. Scanning electron microscopy (SEM) results revealed that the deposition rates of the AlCrTaTiZr coating, AlCrTaTiZr nitride coating and AlCrTaTiZr oxide coating were approximately 2 μm h−1, 0.75 μm h−1 and 0.15 μm h−1, respectively. The properties of these high-entropy alloy (HEA) coatings were studied with electrochemical hydrogen (ECH) permeation test equipment and a high-temperature gas-driven deuterium permeation (GDP) device. The AlCrTaTiZr HEA coating had the best hydrogen permeation resistance during the electrochemical hydrogen permeation test. However, the AlCrTaTiZr nitride coating had the best deuterium permeation resistance during the gas-deuterium permeation test. Annealing experiments of these coatings showed that changes in their microstructures during the gas-driven deuterium permeation test were the main reasons for the different permeabilities of these coatings during the heating and cooling processes. The oxidization of the HEA coating during the deuterium permeation experiment may have been the main reason that the HEA coating showed better deuterium permeation resistance than the HEA oxide coating.

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