Abstract
The resonance method has been used to determine the Young's modulus of 0.54 μm low-stress LPCVD Si x N y films. The films are prepared as thin single-layer cantilevers using standard silicon micromachining techniques. By using different excitation methods, including photothermal, acoustic and mechanical, the thin-beam resonating structures can be forced to vibrate. The influences of air damping and cantilever deflection, produced during preparation, on the cantilever resonance behavior are discussed.
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