Abstract
Time-resolved single-shot measurement has been investigated to characterize switching times of the free layer in magnetic tunneling junctions (MTJs). In this study, a stacked MTJ film is patterned into an elongated, nano-scale device using standard electron beam lithography in conjunction with ion beam etching. Subsequently, current-induced magnetization switching is initiated using a single-shot measurement based on the time-domain transmission method. A current pulse with a duration of 50 ns is utilized to switch the magnetization configuration between parallel and anti-parallel states. After the pulse rises, the transmission profile shows a transition in which resistance varies. That is, the incubation time between pulse onset and resistance change represents the switching time of the free layer. The statistical distribution results of the switching times are obtained. The switching times are strongly dependent on current density and the external magnetic field. By fitting the data points using the Neel-Arrhenius law, the thermal stability factor JCo and intrinsic current density JCo are also determined.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
