Determination of the Energy of the Metal−Underpotential-Deposited Hydrogen Bond for Rhodium Electrodes

Abstract

Investigation of the underpotential deposition of hydrogen (UPD H) on Rh electrodes in 0.05, 0.10, and 0.50 M aqueous solutions of H2SO4 in the 273−343 K temperature range by cyclic voltammetry (CV) demonstrates that upon temperature increase the CV profiles shift toward less-positive values. The CV hydrogen adsorption/desorption diagrams are symmetric with respect to the potential axis, indicating that the UPD H is a reversible process. Theoretical treatment of the experimental data based on an electrochemical adsorption isotherm allows determination of the Gibbs free energy of adsorption, ΔGads°(HUPD), as a function of temperature and the H surface coverage; it varies between −8 and −18 kJ mol-1. Temperature dependence of ΔGads°(HUPD) for a constant surface coverage of the underpotential-deposited H (HUPD) allows determination of the standard entropy of adsorption, ΔSads°(HUPD), which is found to be between −15 and −125 J mol-1 K-1. Subsequently, ΔHads°(HUPD) is determined to be between −15 and −52 kJ m...