Abstract
The effect of a strong microwave field on the shape of the line HeI 4 3 D → 2 3 P in dense microwave produced plasmas ( f=9.4 GHz, P ≈ 180 kW, pulse length ≈ 1 μsec) was studied experimentally and numerically. Profiles obtained in the afterglow of the discharge agree very well with profiles computed with the Model-Microfield-Method (MMM) so that the error of the electron density determination is kept within ±5% limits. At the beginning of the discharge measured line profiles show a significantly enhanced forbidden component compared to MMM-profiles. The calculation of the line profile includes both the r.f.-field as well as the statistically distributed plasma microfield. Due to the high electron densities (10 14cm -3< n e<10 16cm -3) the influence of the r.f.-field (the electric field amplitude is of the order 100 kV/m) proves to be negligible at densities higher than 5 × 10 14cm -3. At lower electron densities the discrepancy between measured and MMM-profiles can be traced back to the presence of the r.f.-field and thus delivers the r.f.-amplitude besides the electron density.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Quantitative Spectroscopy and Radiative Transfer
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
