Abstract

In this work, we will present the determination of chemical composition across heterointerfaces in the layer stacks of devices such as heterojunction bipolar transistors (HBT) and resonant tunneling diodes (RTD) by scanning transmission electron microscopy (STEM). We used STEM-based atomic number ( Z) contrast imaging in order to analyze interface abruptness in HBT and RTD structures qualitatively with monolayer spatial resolution. Electron energy-loss spectroscopy (EELS) was used for the quantitative chemical analysis of individual ultrathin layers such as RTD barriers. The obtained structural data can be used to improve and refine device modeling and design, e.g., composition profiles can be converted into band structures or barrier widths and exact barrier shapes in RTDs can be measured directly. Examples for correlations between structural data and device properties will be given for InP-based HBT and RTD structures.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.