Abstract
We describe a procedure for arc source chemical atomic emission analysis of high-purity TeO2-WO3 tellurite glasses using preconcentration of nonvolatile impurities via reactive vaporization of the major glass constituents by fluorination with xenon difluoride in an autoclave. The detection limits of impurities are 10−8 to 10−6 wt %.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
