Abstract
The determination of impurities in high-purity solvents, (acetone, isopropanol, trichloroethylene and trichlorotrifluoroethane) used in the production of integrated circuits was carried out by reactor neutron activation analysis. A special vacuum evaporation technique was used for the preconcentration of the solvents. The results showed that sodium and iron are the main impurity components in the solvents and on the other hand the quality of the solvents satisfies the specifications required by high-technology standards. The suspended solid particles in solvents were counted by a Microscopic Image Analysis System (MIAS).
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