Determination of carrier recombination lifetime in InGaAs quantum wells from external quantum efficiency measurements

Geoffrey K Bradshaw,Peter C Colter,Joshua P Samberg,Salah M Bedair,C Zachary Carlin

doi:10.1109/pvsc.2013.6744143

Abstract

GaAs cells containing multiple quantum wells (MQW) of strained InGaAs/GaAsP can enhance efficiency in multijunction solar cells. Determination of carrier recombination lifetime in the InGaAs well is useful to understand material quality and carrier transport across the structure. GaAs p-i-n structures with and without strain balanced In 0.17 Ga 0.83 As wells and GaAs 0.25 P 0.75 barriers were grown by MOCVD on p-type GaAs substrates. The GaAsP barrier thickness was varied between devices to intentionally influence carrier transport. A decrease in EQE was observed as barrier width was increased, which was attributed to an increase in tunneling lifetime, τ tn . While this EQE decrease is undesirable in practical devices, it is useful for determining the recombination lifetime, τ r , of the InGaAs wells. The decrease in EQE was observed only at wavelengths of light greater than 600 nm, indicating that minority carrier electrons generated in the base are responsible for the reduction in EQE. Shorter wavelengths (<;600 nm) of light are almost completely absorbed before reaching the base and primarily generate holes in the emitter. The tunneling lifetime and the currents generated in the p-i-n structures were modeled to calculate the EQE of a GaAs control and both thick and thin barrier MQW devices. The probability of transport through the entire MQW structure, P tot , was varied until the calculated EQE fit the experimental data. The value of P tot was then correlated to the only unknown parameter, the recombination lifetime. Using this method the recombination lifetime in In 0.17 Ga 0.83 As in the QW was determined to be 110 ns, which agrees with values found in previous time resolved photoluminescence measurements of metamorphic InGaAs films.

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