Abstract

A heat transfer study was conducted, in the framework of Computational Fluid Dynamics (CFD), on a Hot-Wire Chemical Vapour Deposition (HWCVD) reactor chamber to determine a safe deposition distance for atomic hydrogen produ... | Find, read and cite all the research you need on Tech Science Press

Highlights

  • Hot-wire Chemical Vapour Deposition (HWCVD), is an elegant low pressure deposition technique used for the deposition of functional thin films

  • A heat transfer study was conducted, in the framework of Computational Fluid Dynamics (CFD), on a Hot-Wire Chemical Vapour Deposition (HWCVD) reactor chamber to determine a safe deposition distance for atomic hydrogen produced by HWCVD

  • The determination of a safe deposition distance for atomic hydrogen in a HWCVD reactor chamber was investigated. This was done through CFD heat transfer simulations using the CFD software OpenFoam

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Summary

Introduction

Hot-wire Chemical Vapour Deposition (HWCVD), is an elegant low pressure deposition technique used for the deposition of functional thin films. Since its first patent in the early 1980s [1,2,3], the HWCVD technique has been improved considerably and is currently a viable method for the deposition of many different functional films, both organic and inorganic. The HWCVD technique is based on the decomposition of precursor gasses at a catalytic hot surface. Since repeatability is a key aspect of any experiment, adequate time should be taken to understand the layout and geometry of the HWCVD reaction chamber as well as how different deposition parameters will affect the quality of the resulting film. Conducting multiple trial experiments to achieve this end becomes expensive and time consuming. This is where Computational Fluid Dynamics (CFD) and material modeling becomes an invaluable tool. By developing a functional computer model of the system, the experimentalist obtains the ability to run multiple

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