Determination in Situ of Chemical Solvent Vapors in a Semiconductor Workplace with an Open Path FTIR Spectrometer

Abstract

AbstractAn FTIR spectrometer having a long absorbing path in an open field mode is applied to measure the air quality of semiconductor facilities, especially for chemical solvent vapors. This spectrometer is demonstrated to be a proper instrument to monitor chemical solvents widely used in the manufacture of integrated circuits. By means of the great sensitivity accruing from the kilometer pathlength, we discovered that many residual chemical solvent vapors are released in these workplaces; the limit of detection can attain the level of parts per billion by volume. Recognized spectra of chemical solvents, such as 2‐ethoxyethyl acetate, 2‐propanol, hexamethyl disilazane, aromatic hydrocarbons, alkyl derivatives of phenol, alkyl benzene sulfonate and dimethyl sulfoxide, are calibrated qualitatively and quantitatively. The related integrated absorption coefficients (or band intensities) are listed in this paper. By examining the measured spectra, we found two chemical solvents (2‐propanoI and hexamethyl disilazane) in the workplace, at concentrations about 20‐500 ppbv in such environments.