Abstract
We have developed a novel beamline for SR (synchrotron radiation) lithography using a compact storage ring. The beamline consists of two ellipsoidal focusing mirrors, collecting 34.9 mrad of the horizontal angle of the fan-shaped SR, which delivers X-rays of high intensity onto the wafer. Moreover, an X-ray stepper of Karl Süss, XRS-200, will be attached to the end of the beamline; it offers the exposure field of 25×25 mm2 in the atmospheric environment. An optical design was realized using a sophisticated method which combines a ray-tracing method with a nonlinear optimization method, the Davidon-Fletcher-Powel (DFP) method. This optimized optical design yielded excellent transmission of photon flux throughout the beamline. We will also discuss the spectral and the spatial uniformity of the illumination, and the quality of the printed image.
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