Design, optimization and fabrication of 2D photonic crystals for solar cells

Abstract

This paper presents the optimization of 2D photonic crystals (PCs) onto Si wafers to improve the performance of c-Si PV cells. The objective is to find a structure capable of minimizing the reflectance of the Si wafer in the spectral range between 400nm and 1000nm. The study has been limited to PCs that can be fabricated and characterized with the tools and technology available and to dimensions in the same order as the visible light wavelength. PCs with different shapes and dimensions have been simulated and finally the optimum structure has been fabricated by a process based on laser interference lithography (LIL) and reactive ion etching (RIE). This optimized PC presents an average reflectance of 3.6% in the selected wavelength range, without any other material used as antireflective coating. This result means a drastic reduction in comparison with reflectance obtained out of the standard wet etch texturization used in current solar cell manufacturing lines.