Abstract
A multilayer reflectarray composed of two stacked arrays with rectangular patches of variable size is demonstrated. A progressive phase distribution on the reflector surface is achieved by adjusting the dimensions of the patches. The phase of the reflection coefficient at each element is computed by the method of moments in the spectral domain, assuming local periodicity. A technique is presented for the design of dual polarization reflectarrays that yields all the dimensions for the photo-etching mask. A prototype has been design, built and measured, and a superior bandwidth performance has been verified, compared to conventional single layer reflectarrays.
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