Abstract
As a part of a novel maskless optical lithography system, an optical head unit consists of a spatial light modulator and an aspherical microlens array on aperture stop array was suggested to generate and modulate multi optical probes. The aspherical microlens array on aperture stop array was designed to obtain small beam spot size with sufficient depth of focus and eliminating jitters. The aspherical microlens array on aperture stop array was fabricated by using general photolithography and UV-imprinting. The multi optical probes with spatial light modulation were generated and the characteristics of the optical probes were analyzed.
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