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Abstract
In order to improve the light reflectance efficiency and to decrease the overlay of tricolor output spectra of a color filter, based on dielectric thin film with nano-scale grating structure, three primary color filters (Red, Green and Blue) located at 635nm, 530nm and 455nm are proposed. The design is obtained by adjusting the geometrical parameters after analyzing the reflection response of the proposed grating structure with various fill factor f, groove depth d and period p for the normal incidence TE-polarized light based on rigorous couple-wave analysis method. The reflectance curve shows that high reflectance and low sideband level with full width at half maximum is 50nm, 46nm and 42nm. It indicates that the proposed color filter will be readily exploited for upgrading the performance of various types of displays, image sensors and biomedical imaging technologies applications.
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Schedule a callMore From: Optik - International Journal for Light and Electron Optics
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