Abstract
This paper proposes a grouping design method based on a combination of spatial ray tracing and aberration correction to construct the initial structure for an off-axis multi-reflective aspheric optical system. This method establishes a mathematical parameter model of the optical system to satisfy the aberration balance and multi-constraint control requirements. The simulated annealing particle swarm algorithm is applied to calculate the initial optical system structure. Finally, an extreme ultraviolet (EUV) lithography projection objective with six-reflective aspheric mirrors is used as an example to verify the reliability and effectiveness of this method. A 0.33 numerical aperture EUV lithographic objective with wavefront error better than 1/70λ(λ=13.5nm) root mean square (RMS) is obtained.
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