Design, characterisation and operation of an inverted cylindrical magnetron for metal deposition

Abstract

An inverted cylindrical magnetron device for a continuous all-side deposition of metal films onto wires and temperature-sensitive synthetic fibres was designed and tested. Design features of interest include easy assembly and disassembly of the device for maintenance and upgrading. Using silver as a sputter target, the important performance characteristics including the influence of magnetic field strength, the IV-characteristics, the deposition rate and homogeneity, the erosion profiles of the cathode and the heat load on free-standing substrates were determined. The deposition rate and the substrate temperature were found to be closely related to the sputtering power. Optimum operating conditions, combining a low heat load and a high deposition rate, were determined. In the centre region, a maximum deposition rate of 1800 nm/min was achieved. The erosion profile of the sputter target resulted in a utilisation efficiency of 57%.