Design and optimization of CMOS layout structure for improved semiconductor device performance

Abstract

CMOS layout structure plays a very important role in the field of semiconductor. Since the invention of CMOS technology in the 1970s, engineers have developed many other CMOS layout technologies based on it. This paper will also focus on the CMOS transistor layout structure, focusing on the analysis of three more important structures, demonstrating their impact on the performance of semiconductor devices. Before that, this paper will first introduce the basic theory of CMOS, such as the drift and diffusion of charge carriers in PN junctions, and the working principle of PMOS and NMOS, so as to facilitate us to further describe the optimization and improvement of CMOS structure. Then, the performance and characteristics of each structure are introduced in detail, and finally the comparison is made to highlight their advantages in technology and performance compared with traditional structures. In the future, CMOS structure layout will also become a hot spot, constantly creating more reasonable and advanced structures to improve semiconductor performance.