Abstract
When used at non-normal incident situation, optical thin film spectrum curve will exhibit strong polarization deviation. For many applications, this polarization effect was undesired and should be reduced. In this paper, a multi-wavelength all-dielectric nonpolarizing beam splitter operating at wavelength 532nm, 633nm and 1315nm with incident 45° was designed, which was gained by choosing a initial film stack with little polarization splitting and then utilizing the needle thin film synthesis method and conjugate graduate refine method. Plasma-assisted evaporation deposition technology was made to deposit the thin film system. Experimental study also included an annealing process. Considering numerical and experimental results, we can find that the polarization deviation at wavelength 532nm, 633nm and 1315nm were all very little.
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