Abstract
We introduce an efficient design approach for Ultraviolet (UV) band-pass filter based on metal-dielectric stacks. We present a general design method and then apply this design to two special cases: a UV band pass filter based on (i) Al/Al2O3 stacks as well as (ii) Ag/SiO2 stacks. As an experimental confirmation, we fabricate a UV filter with three Ag/SiO2 layer pairs on a fused silica substrate (Corning 7980), targeting a central wavelength of 320 nm. A measurement at the peak wavelength shows transmission efficiency as high as 67% in our filter.
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