Abstract
A new design of graded reflectivity mirrors is presented. It consists in depositing an appropriately shaped thin layer of a high-refractive-index dielectric on a transparent substrate. The technique used to deposit the profiled layer is discussed. Mirrors with Gaussian reflectivity profiles have been fabricated for use at 10.6 and 3.7 μm. An interferometer which has been setup to characterize the distortions of the reflected and transmitted wave fronts of one of the 10-μm prototypes is described and the results are presented.
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