Depth profiling of titanium using a resonance in 48Ti(p,γ)49V nuclear reaction

Abstract

Depth profiling of titanium using the resonances at 1,007, 1,013 and 1,362 keV in 48Ti(p,γ)49V nuclear reaction (E γ = 7.9 MeV) has been investigated. The resonance at 1,362 keV with a detection sensitivity of ~5.1 × 1020 at. cm−3 (~ 1 at.%), probing depth of ~800 nm and a depth resolution of ~24 nm in silicon is best suited for analytical applications. Lower probing depth and lesser detection sensitivity are the major limitations of the two other resonances. The applicability of the resonance at 1,362 keV is demonstrated by depth profiling Ti in Pd (32 nm)/Ti (57 nm)/Mg (300 nm)/Ti (57 nm)/Si multi-layered coating.