Deposition Sequences for Atomic Layer Growth of AlN Thin Films on Si(100) Using Dimethylethylamine Alane and Ammonia

Abstract

AbstractRecent studies have demonstrated that dimethylethylamine alane (DMEAA) is a viable group III precursor for depositing high quality aluminum nitride thin films during atomic layer growth with ammonia as the group V source. However, a practical consideration that is questioned but seldom investigated is whether one should initiate the growth with the group III or the group V source. Clearly DMEAA interacts differently with silicon than does ammonia; hence, reversing the deposition sequence will lead to different interfacial composition. Earlier studies involving TMAA and ammonia indicate that direct interaction of group III precursor with the surface may lead to higher carbon contamination. In this work, adsorption of DMEAA on Si(100) and on ammonia-covered Si(100) are characterized with Temperature-Programmed Desorption (TPD), Secondary-Ion Mass Spectrometry (SIMS), and Temperature-Programmed Secondary-Ion Mass Spectrometry (TPSIMS). Preliminary results indicate that DMEAA adsorbs molecularly on both Si(100) and ammonia-covered Si(100), but to a much smaller coverage on the latter surface. Results from reversing the adsorption sequence, i.e. ammonia first then DMEAA, will be compared as a possibility for interfacial quality control.