Abstract
High-k gate dielectric HfTiOx thin films have been deposited on Si and quartz substrate by radio frequency (RF) magnetron sputtering. The structural and optical properties of HfTiOx thin films related to deposition power are investigated by X-ray diffraction (XRD), ultraviolet–visible spectroscopy (UV–Vis), and spectroscopic ellipsometry (SE). Results indicate that the as-deposited HfTiOx thin films are amorphous state regardless of the deposition power. The increase of band gap of the samples is observed with the increase of deposition power. Moreover, the increase of the thickness, deposition rate, refractive index (n) and the decrease of the extinction coefficient with the increase of deposition power are also confirmed. Additionally, the electrical properties of films are analyzed by measurement of high frequency capacitance–voltage (C–V) and leakage current density-voltage (J-V) characteristics. And the leakage current conduction mechanisms are also discussed.
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