Abstract

Summary form only given. New model of a DC arc plasmatron was developed. It was used for deposition of thin ZnO and Al2O3 films on the inner walls of acryl tubes. Deposition was done on the air. Tubes with inner diameter of 60 mm were used. The special construction of the plasmatron allows depositing films on plastic substrate because of low heating. Substrate temperature didn't exceed 40degC during the deposition process. Zinc acetylacetonate and aluminum acetylacetonate were used as a source material and oxygen as a working gas and argon as cathode protect gas. The plasmatron powered was varied in the range of 700-1500 watts to optimization of the deposition parameters and properties of the growth films. Deposition rate about 100 nm/min was achieved. The crystal structure and surface composition of the films were analyzed by X-Ray diffractometry and X-ray photoelectron spectroscopy. Four probe technique was used for the resistivity measurement. The transmittance of films was measured using spectrophotometry.

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