Abstract
Transparent niobium oxide thin films were prepared by dc reactive magnetron sputtering under different oxygen flow rate. The niobium oxide thin films have been deposited on silicon wafer and glass substrate from a 99.99% pure niobium target at room temperature. The films were characterized to obtain the relationship between oxygen flow rate and deposition rate, structural, morphology and optical. The result show that the deposition rate decreased with increasing the oxygen flow rate. However, the transmittance spectrum percentage increases with increasing the oxygen flow rate.
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