Abstract
There was highly need to coat the structural steel 1018 with thin layer of Titanium. The conventional method of coating thin layers is spattering but it was very difficult to layer thickness with some nanometres. Spattering method used for hours to deposition nearly about 50 nm of Titanium at very high voltages of target reach to 1250 V. Thin layer of titanium film was successfully deposited on steel substrate. The layer thickness of titanium could reach up to 500 nm with filament heating temperature of 1400 °C and heating time of 45 min which is superior compared to DC sputtering and faster in thickness of coating about twenty times. The deposited layer was investigated using scanning electron microscopy (SEM) and atomic force microscopy (AFM). The resulted phases were evaluated using x-rays diffraction (XRD). The adhesion force was up to 200 psi.
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