Abstract
Metallic titanium film was deposited on H-13 steel substrate at 470°C - 530°C using plasma enhanced chemical vapor deposition (PECVD) method. In this paper, the effects of manufacturing parameters were investigated on deposited titanium coating characteristics. XRD, FESEM, XPS and AFM were used in order to study coating characteristics. Increasing hydrogen flow rate from 200 to 360 sccm, resulted in a 72% decrease in oxygen content and 38% decrease in chlorine content of the film. Applied plasma voltage has a severe effect on nanohardness of coating. Pressure of the deposition chamber has a negative effect on titanium characteristics.
Highlights
There are varieties of techniques available such as conventional chemical vapor deposition (CVD), physical vapor deposition (PVD) and plasma enhanced chemical vapor deposition (PECVD) to deposit ceramic and metallic coatings
Metallic characteristics of titanium film were needed [4]-[6], so achieving a metallic and ductile film with low oxygen content was the goal of this research
Oxygen is solved in the titanium film according to phase diagram of titanium and oxygen
Summary
There are varieties of techniques available such as conventional chemical vapor deposition (CVD), physical vapor deposition (PVD) and plasma enhanced chemical vapor deposition (PECVD) to deposit ceramic and metallic coatings. Among these, the latter has some advantages such as low deposition temperature, better adhesion of. There is little information available about using plasma enhanced chemical vapor deposition method and the effect of plasma parameters on coating characteristics. These systematic data is very vital to achieve a coating which satisfies the needs of today’s industry. Oxygen content deteriorates metallic characteristics such as ductility and fracture toughness
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