Deposition of thin films of organic–inorganic hybrid materials based on aromatic carboxylic acids by atomic layer deposition

Abstract

Thin films of organic-inorganic hybrid materials have been grown by the atomic layer deposition (ALD) technique, using trimethylaluminium (TMA) and aromatic carboxylic acids such as 1,2-benzene dicarboxylic acid, 1,3-benzene dicarboxylic acid, 1,4-benzene dicarboxylic acid, 1,3,5-benzene tricarboxylic acid, 1,2,4,5-benzene tetracarboxylic acid as precursors. Growth rates as function of temperature show that all systems, with the exception of the benzoic acid-TMA system, possess ALD-windows and provides growth rates in the range of 0.25-1.34 nm/cycle. X-ray diffraction studies of the as-deposited films reveal their amorphous character, which is also supported by very low surface roughness as measured by atomic force microscopy. As-deposited films were investigated by Fourier Transform Infrared Spectroscopy proving that the deposited films are of a hybrid character.