Deposition of thallium sulfide layers on polyethylene and nanostructured silica by a sulfurisation‐reaction process

Abstract

AbstractThallium sulfide layers on the surface of polyethylene are formed if they have been sulfured in a solution of higher polythionic acid, H2S33O6, and then treated with the alkaline solution of thallium(I) sulfate. Three phases TlS, Tl2S, Tl2S2 were identified by X‐ray diffraction analysis in thallium sulfide layers. Surface morphology of the films was characterized with a scanning electron microscope (SEM) and atomic force microscope (AFM). The films deposited on the PE substrate have a no‐homogeneous structure and consist of separated islands, the average roughness up to 10 µm. The deposition on the silica‐polystyrene beads matrix has a homogeneous structure and the average roughness is in the range of 100–150 nm. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)