Deposition of Mo films by ion beam assisted excimer laser PVD method

Abstract

The effect of ion beam irradiation on the adhesion strength of Mo films was examined using an ion beam assisted excimer laser PVD apparatus. We also examined the effect of energy density, target-substrate distances, and target rotation on the surface morphology. Spectroscopic diagnosis for a Mo plume was performed. The adhesion of the Mo film was improved by ion beam irradiation which removes a thin surface layer of the substrate. Smooth surface Mo films without droplets were successfully formed under laser fluence conditions of less than 0.25MJ/m2, a target-substrate distance greater than 40mm, and with target rotation. Mo films with a b.c.c. structure show the (110) preferred orientation of . The Mo plume generated by laser ablation is in an excited state containing Mo+.The effect of ion beam irradiation on the adhesion strength of Mo films was examined using an ion beam assisted excimer laser PVD apparatus. We also examined the effect of energy density, target-substrate distances, and target rotation on the surface morphology. Spectroscopic diagnosis for a Mo plume was performed. The adhesion of the Mo film was improved by ion beam irradiation which removes a thin surface layer of the substrate. Smooth surface Mo films without droplets were successfully formed under laser fluence conditions of less than 0.25MJ/m2, a target-substrate distance greater than 40mm, and with target rotation. Mo films with a b.c.c. structure show the (110) preferred orientation of . The Mo plume generated by laser ablation is in an excited state containing Mo+.