Abstract

Pulsed laser ablation from oxide surfaces in hydrogen atmosphere is shown to be a powerful new method for deposition of high quality metal films. Specifically, the cases of ablation from CuO and α-Fe2O3 are studied. By examining the effects of hydrogen pressure, laser energy density, and the substrate temperature on the nature of the deposited films, optimum parameters have been identified for realization of high quality films of metallic Cu and Fe.

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