Deposition of magnesium nitride thin films on stainless steel-304 substrates by using a plasma focus device

Amir Hoshang Ramezani,Maryam Habibi,Mahmood Ghoranneviss

doi:10.1007/s40094-014-0146-4

Amir Hoshang Ramezani, Maryam Habibi + Show 1 more

Open Access

https://doi.org/10.1007/s40094-014-0146-4

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Abstract

In this research, for the first time, we synthesize magnesium nitride thin films on 304-type stainless steel substrates using a Mather-type (2 kJ) plasma focus (PF) device. The films of magnesium nitride are coated with different number of focus shots (like 15, 25 and 35) at a distance of 8 cm from the anode tip and at 0° angular position with respect to the anode axis. For investigation of the structural properties and surface morphology of magnesium nitride films, we utilized the X-ray diffractometer (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM) analysis, respectively. Also, the elemental composition is characterized by energy-dispersive X-ray (EDX) analysis. Furthermore, Vicker’s microhardness is used to study the mechanical properties of the deposited films. The results show that the degree of crystallinity of deposited thin films (from XRD), the average size of particles and surface roughness (from AFM), crystalline growth of structures (from SEM) and the hardness values of the films depend on the number of focus shots. The EDX analysis demonstrates the existence of the elemental composition of magnesium in the deposited samples.

Highlights

Metal nitride coatings are extensively employed in various scientific and industrial applications, because of their remarkable properties [1,2,3,4,5]
The results show that the degree of crystallinity of deposited thin films, the average size of particles and surface roughness, crystalline growth of structures and the hardness values of the films depend on the number of focus shots
304-type stainless steel substrates fixed at the axial distance of 8 cm from the anode tip and exposed to different numbers of focus shots at 0° angular position with respect to the anode axis

Summary

Introduction

Metal nitride coatings are extensively employed in various scientific and industrial applications, because of their remarkable properties [1,2,3,4,5]. Magnesium nitride films (Mg3N2) are of particular interest and have wide range of applications, which can be used for preparation of high hardness, high thermal conductivity, corrosion resistance, abrasion resistance and high temperature of the other elements of the nitrides, preparation of special ceramic materials, manufacture of special alloy blowing agents, manufacture of special glass, catalytic polymer cross-linking, nuclear waste recycling and synthesis of diamond and cubic boron nitride as catalyst material [6, 7]. Thin films can be grown with different nano-structures, crystallographic orientations and chemical compositions [8,9,10,11]

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