Abstract
In this study, a dual-power (RF-superimposed DC) with four-target magnetron sputtering system was used to deposit transparent, conducting indium-tin-oxide (ITO) films on polycarbonate (PC) substrates at low-temperatures process (25–120 °C). A sheet resistance of 350–500 Ω/sq, resistivity of ~10−4 Ω-cm, and light transmittance of 88% in the visible range were achieved. In addition, the simulation and experimental results showed that the deposited 20-nm-thick ITO film with two- and four-layer anti-reflective film (SiO2/TiO2 and SiO2/TiO2/SiO2/TiO2) structures could improve the light penetration characteristics. The transmittance of the multilayer stack (ITO/anti-reflective films/PC) can reach 91% which is ~3% higher than that of the bare ITO-on-PC sample. The experimental results also showed that the low turbidity (haze < 0.08%), excellent adhesion (ASTM class is 5B), and hardness (2H–4H) of ITO/anti-reflection films/PC structure could be suitable for capacitive touch panel applications.
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