Abstract
A d.c. glow discharge deposition system is described which allows the independent control of the substrate current density by using several discharge power supplies. The system consists of a magnetron cathode with permanent magnets and a magnetic coil placed behind the magnetron target, three cages with permanent magnets and an auxiliary anode parallel to the magnetron target surface. The magnetron cathode, auxiliary anode and magnetic cages enclose the deposition volume in which the substrates to be treated are placed. An open geometry magnetic field is obtained in the deposition volume by suitable arrangement of the permanent magnets. The main gas discharge in the system is a balanced magnetron discharge obtained by means of a 20 kW power supply. Three additional power supplies are used to unbalance the magnetron magnetic field by adjusting the magnetic coil current, to bias the substrate and to change the potential of the auxiliary anode. The performance of the deposition system was tested during reactive deposition of TiN coatings on HSS steel substrates.
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