Deposition of diamond-like films from a high-velocity flow of a rarefied gas mixture

Abstract

In contrast to the widespread deposition method of carbon films with the activation of gas mixtures on a hot wire, activation (dissociation of hydrogen and methane) is performed in a high-temperature channel formed by a tungsten coil in this study. From this channel, the gas is expanded to the substrate where deposition occurs. A film containing diamond crystals and hexagonal crystals having characteristic features of lonsdaleite is deposited at the channel temperature of 2100°C and the surrounding pressure of 20 mmHg. The diamond-like film is deposited from a high-velocity high-temperature un-ionized flow for the first time.