Deposition of diamond films from plasma of a secondary discharge supported by RF discharge

Abstract

Summary form only given, as follows. This work devoted the correlation between the plasma parameters and electrophysical parameters of a diamond like carbon film. These films are deposited onto mirror-polished Si using a secondary discharge supported by an RF discharge. The plasma parameters such as electron density, electron temperature, plasma potential are investigated by a Langmuire probe. For investigation the films we use Auger spectroscopy, ultraviolet electron spectroscopy and Raman spectroscopy. The dependence of film properties on substrate temperature have been investigated.