Abstract
The Electro-Magnetically Accelerated Plasma Spraying (EMAPS) was developed and applied to the deposition of boron carbide (B4C) powder, which was accelerated and heated by the pulsed high current arc plasma in a coaxial plasma gun and sprayed on the substrate. Dense deposit of crystalline B4C with Vickers hardness of 2600 kgf/mm2 was obtained on the mirror polished SUS304 substrates with high adhesion. It was supposed that the deposit was formed by the impact of B4C particles with the velocity of more than 2.5 km/s for the powder less than 10 µm in diameter and about 2 km/s for 30±10 µm.
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