Abstract
We report on the successful deposition of high quality type I fibrilar collagen thin films by Matrix assisted pulsed laser evaporation (MAPLE). Thin films deposition was performed in a N2 ambient (20 Pa) using a KrF* laser source (λ=248 nm,τ≥20 ns) operated at a repetition rate of 3 Hz, the incident laser energy at a value within the range (20-35) mJ , and the laser spot area was (3.5-18.5)±0.1 mm2. The collagen films were deposited on double face polished 〈100〉 single crystalline Si wafers and characterized by Fourier transform infrared spectroscopy, atomic force microscopy and high-resolution transmission electron microscopy. We demonstrate that our thin films are composed of collagen, with no impurities and the roughness can be controlled by the deposition conditions.
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