Abstract
Carbon deposition and hydrogen codeposition are investigated as functions of ion energy, fluence and target temperature at normal incidence on silicon and graphite by bombardment with mass selected CH 2 +, CH 3 +, CH 4 + and CD 4 + molecule beams. An amorphous hydrogenated carbon layer (a-C:H) is formed in a thickness range of 40 to 130 nm by CH 3 + and CH 2 + bombardment up to a fluence of 3 × 10 18/cm 2. The deposition process, the re-erosion phenomenon and the H C ratio of the a-C:H films are studied between 300 and 1100 K in the ion energy range from 0.15 to 3 keV by means of ion beam analysis and Auger Electron Spectroscopy (AES). The experimental results are compared with TRIDYN computer simulation and previous experimental results of carbon sputtering by atomic H + and C + beams in order to get a better understanding of the interaction between hydrocarbon ions and the carbon-based wall materials in fusion devices.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
