Abstract
Amorphous boron carbide films were deposited with pulsed magnetron sputtering using a sintered B4C target with Ar as the processing gas, and the chemical components, structure, and mechanical properties of the films were investigated. To deposit amorphous boron carbide films using a B4C target, a pulsed power supply (14.4 kHz) was employed. Raman spectroscopy, Fourier transform infrared spectroscopy (FT-IR), and X-ray photoelectron spectroscopy (XPS) were used to characterize the chemical compositions and structure of the films. According to the results of XPS, the B/C ratio in the films synthesized with pulsed magnetron sputtering was 2.21. Nanoindentation tests and ball-on-disk (BoD) tests were performed to evaluate the mechanical properties. It was found that the films deposited by pulsed magnetron sputtering had an average hardness of 32.1 GPa and an average Youngs modulus of 235.1 GPa.
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